Title: UV and ClO2 are both good decontamination technologies for masks

David Shelep was a presenter in the April 2 webinar on mask reuse. He presented two technologies which can decontaminate masks. One uses UV torches and is being utilized by a hospital in Nebraska. The other uses Chlorine Dioxide gas in systems supplied by ClorDiSys. UV will kill all organisms with the proper dosage. The Nebraska Medicine procedure using a room and existing UV torch is easy to implement. The chlorine dioxide gas can penetrate microscopic crevices unlike most other treatment alternatives. The recorded presentation is available through a separate link.

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   Person Information
  •     Shelep,David  -  Paramount Sciences

   Application Sequencing
Company  Product  Process  Other  Subjects  Event  Event  Date  Location  Publication  Publication  Date Text  Descriptor
  • ClorDiSys Solutions, Inc.

  • Paramount Sciences

  • Chlorine Dioxide

  • Mask

  • Ultraviolet Disinfection

  • Decontamination


  • Coronavirus






  • Webinar